{"identifier":"nobleid:/w1/20260516/1CB503C2","arkIdentifier":"ark:/48914/w1/20260516/1CB503C2","version":1,"workTitle":"Impact on TFT Characteristics of Rapid Crystallization of Si using Nickel-Metal Induced Lateral Crystallization","workType":"Journal Article","authors":"Shoichi Nagata, Gou Nakagawa, Tanemasa Asano","description":null,"workUrl":null,"existingDoi":"10.7567/ssdm.2011.m-8-1","createdAt":"2026-05-16T01:23:46.278550Z","canonicalUrl":"https://nobleid.org/ark:/48914/w1/20260516/1CB503C2.v1"}