{"identifier":"nobleid:/w1/20260521/2F482D2B","arkIdentifier":"ark:/48914/w1/20260521/2F482D2B","version":1,"workTitle":"Comparison of ICP-AlOx and ALD-Al2O3 Layers for the Rear Surface Passivation of C-Si Solar Cells","workType":"Journal Article","authors":"Boris Veith, Thorsten Dullweber, Michael Siebert, Christopher Kranz, Florian Werner, N.-P. Harder, Jan Schmidt, B.F.P. Roos, Torsten Dippell, Rolf Brendel","description":null,"workUrl":null,"existingDoi":"10.1016/j.egypro.2012.07.080","createdAt":"2026-05-21T23:29:55.627809Z","canonicalUrl":"https://nobleid.org/ark:/48914/w1/20260521/2F482D2B.v1"}