{"identifier":"nobleid:/w1/20260521/9DA4F7ED","arkIdentifier":"ark:/48914/w1/20260521/9DA4F7ED","version":1,"workTitle":"The effect of the atomic incident angle upon the microstructure of thick beryllium deposits produced by physical vapor deposition","workType":"Journal Article","authors":"T.G. Nieh, R. F. Karlak, A. E. Vidoz","description":null,"workUrl":null,"existingDoi":"10.1116/1.571878","createdAt":"2026-05-21T14:26:41.568106Z","canonicalUrl":"https://nobleid.org/ark:/48914/w1/20260521/9DA4F7ED.v1"}