{"identifier":"nobleid:/w1/20260521/AF2FD888","arkIdentifier":"ark:/48914/w1/20260521/AF2FD888","version":1,"workTitle":"Si nanostructures fabricated by nanoscale local oxidation using an ECR plasma nitride nanomask","workType":"Journal Article","authors":"K. Kurihara, Yoshio Watanabe, Masao Nagase","description":null,"workUrl":null,"existingDoi":"10.1016/s0167-9317(99)00029-5","createdAt":"2026-05-21T22:14:43.829321Z","canonicalUrl":"https://nobleid.org/ark:/48914/w1/20260521/AF2FD888.v1"}