{"identifier":"nobleid:/w1/20260521/BDEF4EF1","arkIdentifier":"ark:/48914/w1/20260521/BDEF4EF1","version":1,"workTitle":"Influence of process parameters on the substrate heating in direct current plasma magnetron sputtering deposition process","workType":"Journal Article","authors":"Jegenathan Krishnasamy, Kah‐Yoong Chan, Teck‐Yong Tou","description":null,"workUrl":null,"existingDoi":"10.1108/13565361011034740","createdAt":"2026-05-21T12:37:59.094262Z","canonicalUrl":"https://nobleid.org/ark:/48914/w1/20260521/BDEF4EF1.v1"}