{"identifier":"nobleid:/w1/20260521/EB68DB01","arkIdentifier":"ark:/48914/w1/20260521/EB68DB01","version":1,"workTitle":"Sub-micron channeling contrast microscopy on reactive ion etched deep Si microstructures","workType":"Journal Article","authors":"Ee Jin Teo, Maan M. Alkaisi, Andrew A. Bettiol, T. Osipowicz, J.A. van Kan, F. Watt, A. Markwitz","description":null,"workUrl":null,"existingDoi":"10.1016/s0168-583x(01)01255-1","createdAt":"2026-05-21T14:12:57.894887Z","canonicalUrl":"https://nobleid.org/ark:/48914/w1/20260521/EB68DB01.v1"}