{"identifier":"nobleid:/w1/20260521/FC697CFB","arkIdentifier":"ark:/48914/w1/20260521/FC697CFB","version":1,"workTitle":"Necessity of resist model in source mask optimization for negative tone development process","workType":"Journal Article","authors":"Lijun Zhao, Lisong Dong, Wenhui Chen, Tianchun Ye, Tianchun Ye, Liwan Yue, Yuntao Jiang","description":null,"workUrl":null,"existingDoi":"10.1117/1.jmm.16.3.033509","createdAt":"2026-05-21T19:39:36.104021Z","canonicalUrl":"https://nobleid.org/ark:/48914/w1/20260521/FC697CFB.v1"}