{"identifier":"nobleid:/w1/20260525/2FD2AB32","arkIdentifier":"ark:/48914/w1/20260525/2FD2AB32","version":1,"workTitle":"Vapor HF sacrificial etching for phosphorus doped polycrystalline silicon membrane structures","workType":"Journal Article","authors":"Haibo Cao, Robert J. Weber","description":null,"workUrl":null,"existingDoi":"10.1109/eit.2008.4554316","createdAt":"2026-05-25T17:23:00.803648Z","canonicalUrl":"https://nobleid.org/ark:/48914/w1/20260525/2FD2AB32.v1"}