{"identifier":"nobleid:/w1/20260526/AFF5ABC8","arkIdentifier":"ark:/48914/w1/20260526/AFF5ABC8","version":1,"workTitle":"Effect of Negative Substrate Bias Voltage and Pressure on the Structure and Properties of Tungsten Films Deposited by Magnetron Sputtering Technique","workType":"Journal Article","authors":"E. Vassallo, Matteo Pedroni, Miriam Saleh, D. Minelli, Giuseppe Firpo, Enrico Miorin, Silvia Maria Deambrosis, Valentina Zin, D. Ripamonti, Luca Origo","description":null,"workUrl":null,"existingDoi":"10.3390/coatings15030319","createdAt":"2026-05-26T00:11:15.226844Z","canonicalUrl":"https://nobleid.org/ark:/48914/w1/20260526/AFF5ABC8.v1"}