Nanostructure formation on silicon surfaces by using low energy helium plasma exposure | NobleID

Main

Mint Work Search Explore Works Knowledge Graph Citation Graph Bibliometrics Receipts

v1

Nanostructure formation on silicon surfaces by using low energy helium plasma exposure

Identifier:nobleid.org/w1/20260515/0DF352E1

Type:Journal Article

0 views

Support unavailableClaim Your Authorship

View Original Paper Source

Embeddable Badge

[![NobleID](https://www.nobleid.org/api/badge/0DF352E1.svg?ark=w1%2F20260515%2F0DF352E1)](https://nobleid.org/work/w1/20260515/0DF352E1)

ARK Inflections

Metadata Policy

Metadata Formats

Bibliometric Analysis

Impact metrics, research fronts, co-authorship networks →

Authors & Claims

Paper Authors

Shuichi Takamura

Yoshihiko Uesugi

Claim authorship of this work

info@nobleid.org

About FAQ Terms Policy Persistence & Resolver Service Policy