In-Line Electrical Metrology for High-K Gate Dielectrics Deposited by Atomic Layer CVD | NobleID

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In-Line Electrical Metrology for High-K Gate Dielectrics Deposited by Atomic Layer CVD

Identifier:nobleid.org/w1/20260525/5C090FDF

Type:Journal Article

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W. F. A. Besling

Jan Willem Maes

Z. M. Rittersma

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